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CONTACT 1 | Steve Etienne |
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Enquire about this item | |
SITE | Bloomsbury Campus |
STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 6 diameter
Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2.
Deposition of silicon oxide, silicon nitride, and stress controlled siliocn oxynitride.`
STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 6 diameter
Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2.
Deposition of silicon oxide, silicon nitride, and stress controlled siliocn oxynitride.`
Item ID #
.Last Updated: 17th January, 2014
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