You are currently viewing only those items made visible to the public. Sign in here with your UCL username and password to view the full catalogue.
|No special training required.
|Enquire about this item
This is a Plasma etcher in a barrel configuration. It is used primariliy for removing organic materials in an Oxygen plasma, such as photoresist. It is an effective technique for cleaning up the residues of photoresist that remain after the Photolithography and develop processes before samples move on to subsequent stages. It has Oxygen, Argon and Air available as feed gases.
Item ID #.
Last Updated: 17th January, 2014