Enquire Now

Furnace Stack

MODEL 4600

London Centre for Nanotechnology

TRAINING Training is required to use this item and we can arrange this if needed.
CONTACT 1 Steve Etienne
CONTACT 2 Vijay Krishnan
Enquire about this item
SITE Bloomsbury Campus


Four independent tubes with max temperature of 1050C

  • 1 High Purity Dry and Wet Oxidation, with TransLC pre-cleaning for CMOS compatible Silicon wafers
  • 2 General Purpose Dry and Wet Oxidation
  • 3 Diffusion and Drive in in Oxidising atmosphere for CMOS silicon wafers
  • 4 Annealing in Hydrogen and Nitrogen atmosphere for CMOS silicon wafers


Samples must be CMOS compatible Silicon wafers, up to 25 wafers per load, up to 150mm diameter,

Item ID #3793.

Last Updated: 29th November, 2018

Furnace Stack

There are no publically available categories listed at present. You may have to sign in to browse this catalogue.