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Shallow Reactive Ion Etcher
| MANUFACTURER | SPTS Ltd |
|---|---|
| MODEL | MP0532 |
| CONTACT 1 | Steve Etienne |
|---|---|
| Enquire about this item | |
| SITE | Bloomsbury Campus |
Description
Surface Technology Systems ICP RIE, + loadlock, samples up to 6 diameter
Gases: CH4, O2, H2, Ar, BCl3, SF6, He, CH4, N2
Process recipes for etching:
Diamond; Si; TiSi2; Al; GaAs and InP
Specification
Surface Technology Systems ICP RIE, + loadlock, samples up to 6 diameter
Gases: CH4, O2, H2, Ar, BCl3, SF6, He, CH4, N2
Process recipes for etching:
Diamond; Si; TiSi2; Al; GaAs and InP
Item ID #.
Last Updated: 17th January, 2014
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