Enquire Now

Lesker Sputtering System

MANUFACTURER Lesker
MODEL PVD75

London Centre for Nanotechnology

TRAINING No special training required.
CONTACT 1 Steve Etienne
Enquire about this item
SITE Bloomsbury Campus

Description

Lesker PVD75, three x 3” diameter sources, RF and DC Substrate RF Bias, O2 injection Max sample size 6”. Material capability: Insulators ZnO, ITO, SiO2. Metals Cr, Cu, Al, Mo, Ta, Al, Au

Specification

Lesker PVD75, three x 3” diameter sources, RF and DC Substrate RF Bias, O2 injection Max sample size 6”. Material capability: Insulators ZnO, ITO, SiO2. Metals Cr, Cu, Al, Mo, Ta, Al, Au

Item ID #2413.

Last Updated: 17th January, 2014

Lesker Sputtering System

There are no publically available categories listed at present. You may have to sign in to browse this catalogue.