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Diener Plasma Asher


London Centre for Nanotechnology

TRAINING No special training required.
CONTACT 1 Steve Etienne
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SITE Bloomsbury Campus


This is a Plasma etcher in a barrel configuration. It is used primariliy for removing organic materials in an Oxygen plasma, such as photoresist. It is an effective technique for cleaning up the residues of photoresist that remain after the Photolithography and develop processes before samples move on to subsequent stages. It has Oxygen, Argon and Air available as feed gases.

Item ID #2451.

Last Updated: 17th January, 2014

Diener Plasma Asher

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