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|CONTACT 1||Steve Etienne|
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This is a Plasma etcher in a barrel configuration. It is used primariliy for removing organic materials in an Oxygen plasma, such as photoresist. It is an effective technique for cleaning up the residues of photoresist that remain after the Photolithography and develop processes before samples move on to subsequent stages. It has Oxygen, Argon and Air available as feed gases.
Item ID #.
Last Updated: 17th January, 2014
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